W-5920i Oscillator Inline Etching System

  • Linear input to output process flow for easy inline system integration
  • Oscillator SMD and VCXO devices are adjusted to target frequency by Ion Beam Etching of the electrode material
  • The motional parameters of the crystal remain virtually unchanged
  • Up to thirty-two (32) parts are processed simultaneously for high system throughput
  • Small crystal electrodes are as easy to precisely adjust as large electrodes
  • Measured parameters are checked against easy to define Q.C. limits
  • Supports small SMD sizes including 3.2x5.0, 3.2x2.5, 2.5x2.0, 2.0x1.6, 1.6x1.25
  • Transport boats carry SMD devices in S&A flip pallets
  • Many pallet matrix configurations available including 16x40, 8x60, 8x30


Measurement Range: 32 KHz to 622 MHz
Etching Performance: ± 1 ppm typical final frequency


  • S&A MFC-100 Card
  • S&A 250B-1 or 250C Network Analyzer
  • Direct Drive Roughing Pump
  • Cryo Pump
  • S&A Ion Gun
  • Computer
  • Windows® based System Software
  • Light Pole


Power: 380VAC/208VAC 3-PHASE, 7KVA, 50/60 Hz
Inlet Pressures:
    Process Gas:
90 – 100 PSIG
90 – 100 PSIG
70 – 100 PSIG
Dimensions: W 53" x D 37" x H 88"